Description
Cascade PAV200 Semi-Automated Vacuum Probe System
The Cascade PAV200 is a high-precision semi-automated probe station designed for wafers and substrates up to 200 mm, with an optional upgrade to 300 mm. Operating in a vacuum environment as low as < 1×10⁻⁴ mbar, the PAV200 delivers unmatched stability and accuracy for advanced wafer-level testing in industrial and research environments.
Engineered to support diverse applications such as DC, C-V, RF, MEMS, and optoelectronic testing, the PAV200 combines flexibility with automation. It can integrate up to eight vacuum probe positioners or a probe card, making it adaptable for complex test setups. Optional accessories, including IR radiation sources (black bodies) and optical motion analysis tools, expand its measurement capabilities.
The robust station frame, vibration-isolated platform, and stable probe arms ensure precise probe placement and reliable results, even for the most demanding MEMS structures. An optional microscope bridge further enhances imaging stability, giving researchers confidence in every measurement.
Ease of use is central to the PAV200 design. The ergonomic front-side loading system allows quick and comfortable device changes, while the joystick-controlled manual probe positioners and software-driven chuck provide intuitive operation. This balance of manual control and semi-automation increases throughput and reduces operator fatigue.
With Velox Probe Station Control Software, the PAV200 simplifies wafer testing workflows. From basic wafer alignment to automated step-and-repeat testing of multiple dies, Velox offers powerful yet user-friendly tools. The optional VeloxPro upgrade provides SEMI E95-compliant automation, making it ideal for large research facilities or high-volume industrial testing environments.
By combining precision engineering, modular flexibility, and intelligent software, the Cascade PAV200 ensures consistent, repeatable results for today’s most complex semiconductor and research applications.
Tabular Data
| Specification | Details |
| Wafer Size | Up to 200 mm (optional 300 mm upgrade) |
| Environment | High vacuum < 1×10⁻⁴ mbar |
| Positioners | Up to 8 probe positioners and/or probe card |
| Thermal Range | Optional chuck: -60°C to 300°C |
| Stability | Vibration-isolated frame, short probe arms |
| Loading | Ergonomic front-side load door |
| Control | Semi-automated with joystick + software chuck |
| Software | Velox (standard), VeloxPro (optional) |
| Applications | DC, C-V, RF, MEMS, Optoelectronic tests |
| Accessories | IR sources, black bodies, optical analysis tools |
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